Description
Materials Scientist with over 10 years of experience in energy-related materials development. Licensed patent, over 40 scientific publications, successful academic-industrial development project leadership.
Work Experience
COMPANY | POSITION HELD | DATES WORKED |
---|---|---|
(Confidential) | (Confidential) | 4/1997 - Present |
Education
SCHOOL | MAJOR | YEAR | DEGREE |
---|---|---|---|
Kiev Institute for Metal Physics | Solid State Physics | 1995 | Doctorate Degree |
Moscow Institute for Physics and Technology | Applied Physics | 1989 | Master Degree |
Moscow Institute for Physics and Technology | Physics | 1986 | Bachelor Degree |
Accomplishments
Highlights:
* Principal Investigator of a research program aimed to find new ways of radically improving structure quality of thick epitaxial layers of complex oxides. The program was rated 3rd out of 10 by U.S. DOE review panel, being described as “Absolutely excellent and innovative.” * Initiated licensing of technology (U.S. patent # 6,794,339) for sub-atmospheric processing of large-area epitaxial layers to a U.S. manufacturing company, established royalty account. * Invented and implemented sub-atmospheric reactor for processing of high volume of oxide tape, U.S. patent # 6,794,339. The invention enabled to increase the production rate by a factor of 5 and reduce carrier gas consumption by a factor of 100. * Set-up high-rate e-beam gun evaporation system for deposition of thick precursor layers (Themescal e-guns, Inficon rate controllers, Balzer’s cryo-pump). Achieved composition uniformity within 2% (analysis using JY-Horiba ULTIMA 2 ICP) over 10 cm area at 3 micron the film thickness and the deposition rate 20 nm/s.Companies I like:
Job Skills
Keywords
Responsibilities
Principal Investigator of a research program aimed to achieve Six Sigma performance of complex oxides web coats deposited by reactive magnetron sputtering.
As a part of applied materials group investigated new ways of ultra-fast processing of epitaxial coatings.