* Developed and presented 8+ classes on Workstream/ELF BKM's for the Defect Metrology area. * Writing inspection recipes for brightfield (KLA 213X) and darkfield inspection systems * Part of team which won Intel's 1995 Portland Technology Development Design of Experiments award. The award was awarded for using statistical models to optimize the capture of real defects on the KLA. * Member of the 1264 MES lotfile user group which defined and tested the new fab execution system * Initiated yield monitoring of Intel's copper process. This involved preliminary engineering work with the defect tools, choosing the points in the process which would be monitored and setting up the operations to run these monitors. * Assisted in startup of Intel's first 300mm Fab, D1C.Assisted in startup of Intel's most advanced Fab D1D/D1X Of course this is just a brief list of my accomplishments and primary abilities/strengths, I can give detail on request of course.
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